Key Features:

• Non-contact, Non-destructive Inspection
• Rapid High Resolution Full-wafer Imaging with Patented ChemetriQ Surface Potential Difference Imaging
• Sub-monolayer Sensitivity to Organic and Metallic Contamination
• Bare and Blanket Wafer Support
• 0mm Edge Exclusion for NVD Edge Inspection
• Q-Viewer™ for Scan-Once-Optimize-Many™ Scan Analysis
• Industry Standard KLARF Output
• Fully Automated and Fab Ready for 200mm/300mm Production Monitoring

Inspection Applications:

• Contamination and Charging from Wet Cleans
• Process-induced Charging in Cleans and Plasma Processes
• Surface Preparation Nonuniformity Detection
• Post Maintenance Quals
• Edge Inspection

Includes Installation & Training

1 Year Technical Support and Warranty Coverage

• 
  ChemetriQ® 3000 Series
• Inspection System
• 
  Production inspection for High-Volume Advanced Fabs to Rapidly Detect and Map Non-Visual Defect Contamination.
  
  
  
  •Go Beyond Optical
  
  •Raise Yield
  
  •Improve Efficiency